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--- afm_film_morphology [2025/07/29 10:15] – created wigbout
+++ afm_film_morphology [2025/07/29 10:51] (current) – rog
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-Hi Matthijs, hier is je pagina!
+====== Surface Morphology ======
+Morphology refers to the shape of an object; in thin films, the surface morphology tells us the shape of the surface. We measure morphology using nanoscale microscopy techniques like STM, AFM and TEM.
+There is a lot of information in the surface structure. By investigating roughness and grain size, you can optimize thin films for various applications. Material, substrate, deposition technique and parameters all influence the final surface structure. Stay mindful however: there is quite a bit of difference between surface and bulk. Silver, for instance, forms sulfide bonds immediately when exposed to air. Therefore, its surface will look very rough under a microscope, whereas it might make a much smoother interface when used as part of a multi-layer device!
+====== Goal of this page / Helping expand ======
+Anyone can help expand this list. In this way, we can collect nice images showing what various deposition techniques and parameters end up doing to our thin films. In this spirit, make sure to collect as much information as possible next to your image.
+However, as often as this list is useful, for many projects, the exact surface structure carries no relevance. Please do not go out of your way to make pretty images, if you don't need them. However, if you do find yourself behind the AFM with your device...an image takes only a few minutes, and might help someone later!
+Make sure that any images you take are high resolution: 512x512 pixels with approximately 1 nm/pixel and a scan speed below 1.8 Hz gives good results on the 7th floor AFMs. Lastly, understand the effect of lithography resist residues: quite some gunk might disappear from your surface, simply by oxygen ashing a few seconds.
+====== Ag ======
+{{:morphology:agmorphology_rmsroughness_2.2nm_black_background.png?400|}}
+Scalebar: 200 nm.
+Roughness: 2.2nm.
+Thickness: 33nm.
+Deposition technique: Z406, Ar gas, standard recipe.
+====== MoGe ======
+{{:morphology:mogemorphology_rmsroughness_0.4nm_black_background.png?400|}}
+Scalebar: 200 nm.
+Roughness: 0.4nm.
+Thickness: 19nm.
+Deposition technique: Z406, Ar gas, standard recipe.
+====== Pt ======
+{{:morphology:ptmorphology_rmsroughness_1.2nm_black_background.png?400|}}
+Scalebar: 200 nm.
+Roughness: 1.2nm.
+Thickness: 95nm.
+Deposition technique: UHV Sputter System, Ar gas, standard recipe.
+====== SiOx ======
+{{:morphology:siox_sputtered_surface_rms_roughness_13nm_black_background.png?400|}}
+Image size: ~3x3 um.
+Roughness: 13nm.
+Thickness: 150nm.
+Deposition technique: Z406, Ar gas, standard recipe.