ag2s:ag2s_thin_film_deposition
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| + | == Feb. 08, 2005 == | ||
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| + | Both\\ | ||
| + | {{ag2s: | ||
| + | {{ag2s: | ||
| + | try to establish the optimal partial pressure of H2S during reactive sputter deposition of Cu2.0 - S1.0 film (chalcocite). My estimate of the values for partial pressure of H2S from these articles is 9x10-4 mbar and ~1x10-3 mbar, respectively (**please verify, I do make mistakes!**) I am planning to try these pressures during the sputtering run on Friday. | ||
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| + | Analysis of the samples can be done with microprobe (using the SEM that used to stand on the 6th floor and is now moved to Amsterdam), resistivity measurements and x-ray for thicker films. | ||
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| + | //-Alex// | ||