Differences

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--- barrel_etcher [2005/04/17 17:02] – (old revision restored) 127.0.0.1
+++ barrel_etcher [2005/04/17 17:05] (current) – external edit 127.0.0.1
@@ Line 1: / Line 1: @@
+====== Description ======
+The barrel etcher is an O<sub>2</sub> resist etcher/stripper for post-development cleaning
+of substrates or cleaning of SEM specimen. It is pumped by a 2-stage rotary pump with Fomblin oil.
+====== Manual ======
+  - Open the O<sub>2</sub> cylinder
+  - Turn the valve to ''vent''
+  - When the door pops open, close the vent valve
+  - Remove the glass boat, //touch it only with gloves//
+  - Put your substrate in the glass boat
+  - Slide the glass boat back into the apparatus, in the middle of the electrodes or 'downstream'
+  - Close the door and switch on the pump
+  - Wait until the pressure drops below 1e-2 mbar
+  - Turn the valve to ''etch''
+  - Set the gas flow so that the chamber pressure is 1e-1 mbar
+  - Switch on the mains of the RF power supply
+  - Switch on RF power (100 W) and time the process (verify that reflected power is zero)
+  - Switch off RF power
+  - Switch off RF power supply
+  - Switch off pump
+  - Vent and remove the sample, turn the valve to ''off''
+  - Leave the system at vacuum with the boat inside and the pump off
+====== Etching rates ======
+^ Material ^   Date   ^  Rate     ^
+| PMMA     | 20050202 | 10 nm/min |
+Be careful when etching resists on catalyst surfaces like Pd or Pt!