cressington_sputter_coater_208hr
Differences
This shows you the differences between two versions of the page.
| Both sides previous revisionPrevious revisionNext revision | Previous revision | ||
| cressington_sputter_coater_208hr [2015/08/07 15:05] – steenis | cressington_sputter_coater_208hr [2015/08/10 08:04] (current) – steenis | ||
|---|---|---|---|
| Line 4: | Line 4: | ||
| ===== Sample Loading ===== | ===== Sample Loading ===== | ||
| + | - Lift the top plate and remove the glass cylinder. Take care that the top-plate does not fall forward. The target can be damaged by striking the sample table. | ||
| + | - Place your sample, mounted on a stub, on the stage. | ||
| + | - Unlock the tilt lever of the stage. | ||
| + | - Set tilt at desired angle and lock the tilt lever again. | ||
| + | - If a thickness controlled process will be used change the angle of the thickness crystal so that it faces towards the sputter target. | ||
| + | - Check that the stage isn't hindered by the wire of the thickness crystal by letting the stage rotate at the desired speed. | ||
| + | - Replace glass cylinder and gently lower the top plate. Check that the top plate sits correctly on the glass cylinder. | ||
| + | - Turn on the system and allow the system to pump to better than 0,01 mbar and then wait for another 5 minutes. | ||
| + | |||
| + | ===== Automatic Controlled Process ===== | ||
| + | ==== Pre-Sputtering ==== | ||
| + | - Select Auto with the auto/manual button. | ||
| + | - Select timer. | ||
| + | - Set pre-sputtering time at 10 seconds by holding PAUSE/TEST and pressing the timer SET buttons. | ||
| + | - Set pre-sputter current to desired value by holding the SET mA button and pressing the timer SET buttons. Available currents 20, 40, 60, and 80 mA. | ||
| + | - Make sure the shutter is closed | ||
| + | - Press CYCLE/STOP to start pre-sputering process. The system will proceed through its standard cycle. | ||
| + | |||
| + | ==== Sputtering ==== | ||
| + | - Select timer for a timed process or MTM for a thickness controlled process. | ||
| + | - Timed process, Change sputtering time by holding PAUSE/TEST and pressing the timer SET buttons. Time can be set between 5 and 300 seconds. | ||
| + | - Thickness controlled process | ||
| + | - Turn on the thickness monitor (MTM 20) | ||
| + | - Set the correct density according to the target material by pressing the DENSITY button once and find the correct setting by scrolling with the scroll buttons. | ||
| + | - Set the correct tooling factor according to stage tilt by pressing the TOOLING button once and find the correct setting by scrolling with the scroll buttons. | ||
| + | - Set desired coating thickness by holding the TERMINATOR button for one second. The value for the thickness will show up and can be adjusted with the scroll buttons. | ||
| + | - Set sputter current to desired value by holding the SET mA button and pressing the timer SET buttons. Available currents 20, 40, 60, and 80 mA. | ||
| + | - Set roatating speed of stage at desired value. | ||
| + | - Open shutter | ||
| + | - Press CYCLE/STOP to start the sputtering process. The system will proceed through its standard cycle. | ||
| + | - After sputtering note the final thickness for a thickness controlled process. | ||
| + | - Close shutter. | ||
| + | |||
| + | ==== When Done ==== | ||
| + | - Switch off the system to automatically vent the chamber, which will take approximately 2 minutes. | ||
| + | - Lift the top plate and remove the glass cylinder. | ||
| + | - Set tilt of the stage to the horizontal position. | ||
| + | - Remove your sample. | ||
| + | - Clean inside of the glass cylinder with a tissue and ethanol to keep the glass clear. | ||
| + | - Replace glass cylinder and gently lower the top plate. Leave the system vented. | ||
| + | |||
| + | ===== Manual process for Cr-sputtering ===== | ||
| + | - Select manual with the auto/manual button. | ||
| + | - Select timer for a timed process or MTM for a thickness controlled process. | ||
| + | - Timed process, Change sputtering time by holding PAUSE/TEST and pressing the timer SET buttons. Time can be set between 5 and 300 seconds. | ||
| + | - Thickness controlled process | ||
| + | - Turn on the thickness monitor (MTM 20) | ||
| + | - Set the correct density according to the target material by pressing the DENSITY button once and find the correct setting by scrolling with the scroll buttons. | ||
| + | - Set the correct tooling factor according to stage tilt by pressing the TOOLING button once and find the correct setting by scrolling with the scroll buttons. | ||
| + | - Set desired coating thickness by holding the TERMINATOR button for one second. The value for the thickness will show up and can be adjusted with the scroll buttons. | ||
| + | - Set sputter current to 80 mA by holding the SET mA button and pressing the timer SET buttons. | ||
| + | - Set rotating speed of stage at desired value. | ||
| + | - Open argon flush valve for 10 seconds, then close. | ||
| + | - Pump to 0,001 mbar | ||
| + | - Open argon flush valve for 3 seconds, then close | ||
| + | - Open leak valve. | ||
| + | - When pressure reaches better than 0,03 mbar set MTM-20 to ZERO for a thickness controlled process | ||
| + | - Press START/STOP to start sputtering | ||
| + | - Initially the discharge will be pink of colour. It will turn blue when the surface layer of chromium oxide is removed and chromium begins toe sputter. | ||
| + | - When plasma turns blue open the shutter | ||
| + | - After sputtering note the final thickness for a thickness controlled process. | ||
| + | - Close shutter. | ||
| ====== Available Targets ====== | ====== Available Targets ====== | ||
| - | ^ Target Material ^ Atomic Number | + | ^ Target Material |
| - | | | + | | Pt/Pd (80/ |
| - | | Cr | + | | Cr | 24 | 7,19 | |
| - | | Ir | + | | Ir | 77 | 22,56 | |
| ====== Deposition Rates ====== | ====== Deposition Rates ====== | ||
| - | ^ Material | + | ^ |
| - | | | + | | Pt/Pd (80/ |
| - | | | + | | |
| - | | | + | | |
cressington_sputter_coater_208hr.1438959907.txt.gz · Last modified: 2015/08/07 15:05 by steenis