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--- ebpg_raith-100 [2025/04/30 13:34] – [Extra reading] wigbout
+++ ebpg_raith-100 [2025/07/29 10:30] (current) – wigbout
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+====== Raith 100 E-beam Lithography (EBL) ======
+===== Introduction =====
+The Raith 100 is a direct-write machine used for maskless lithography.
+A 30 keV electron beam is emitted from a field-emitter, and is focused through electromagnetic lenses.
+Using a deflection system the beam can be moved in the xy-plane.
+Lithography is crucial for the [[https://en.wikipedia.org/wiki/Planar_process|planar process]] (i.e. fabrication of devices), since it is one of the few techniques((along with, e.g. FIB and (F)EBID)) that allows //local// changes, whereas deposition and etching typically is a //global// step.
+If you would like to use this system, contact [[wigbout@physics.leidenuniv.nl|Luc Wigbout]].
+**The Raith 100 EBL system is located in the Cleanroom. Before you can use this system, you should have had a [[Cleanroom Safety Training]].**
+----
 ===== Preparing and loading substrate =====
   - Spincoat your resist of choice, see [[resist_and_e-beam_recipes|resist recipes]]