Differences

This shows you the differences between two versions of the page.

--- fei_nanosem_200 [2011/02/22 17:00] – wolfgang
+++ fei_nanosem_200 [2017/04/03 12:41] (current) – [Manual] scholma
@@ Line 61: / Line 61: @@
   - Before starting, fill out the logbook
   - Prepare your sample on the preparation table, mount it on a stub
-  - Log out if necessary, login
   - Click 'Vent'
-  - Unfreeze CCD
+  - Make sure CCD (bottom right screen) is unfrozen.
   - Mount the stub onto the stage, use the elephant to set a safe height
-  - Check CCD when closing chamber
+  - Keep an eye on CCD when closing the chamber
   - Click 'Pump'
-  - Wait until a low enough final pressure is reached
+  - Wait until a 1e-5 mbar is reached
   - Choose HV and spot
-  - Click 'HV'
+  - Click 'HV' to turn on the beam.
   - Adjust contrast and brightness
   - Focus (on the highest point of the sample) at a magnification > 2000 times
   - Link Z to FWD
-  - Drive sample up to 10-15 mm, check CCD, be prepared to hit 'Esc'
+  - Drive sample up to 10-15 mm, check CCD, keep finger above 'ESC-key'
   - Focus well at a magnification >2000 times
   - Link Z to FWD again
   - Drive sample up to the working height, check CCD, be prepared to hit 'Esc'
   - Set eucentric if necessary (see below)
+  - LOCK Z-axis. Now you can switch to single-view.
   - You are in search mode, go to the feature of interest
   - Increase magnification
   - Switch to UHR mode (for a nonmagnetic sample)
-  - Focus, correct astigmatism
+  - Focus, correct astigmatism, lens alignment
   - Collect data
-  - When ready, click 'Vent' (High voltage, detectors and pumps are automatically switched off, stage drives down in a safe way)
+  - Fill in logbook before venting
+  - Go to QUAD-view, unlock Z
+  - When ready, click 'Vent' (High voltage, detectors and pumps are automatically switched off, stage drives down in a safe way), be prepared to hit 'ESC'
   - Remove your specimen stub
-  - Call next user or pump down in 'HV' mode (don't keep chamber vented for a significant amount of time)
+  - Call next user or pump down (don't keep chamber vented for a significant amount of time)
-  - Log out and close the log entry in the logbook
   - At the end of the day, switch off the displays
   - Go to your PC and transfer the data
@@ Line 114: / Line 115: @@
 ^ Material ^  Date     ^ Sample ID ^ Process parameters                         ^ Measured with  ^ Result         ^ Rate  ^
-| Pt       | 20050415  | Pt1 (Marcel) | Spot 5, 50% overlap, 1000 passes, 1 us dwell  | AFM            | to be measured | -     |
+| Pt       | 20050415  | Pt1 (Marcel) | Spot 5, 50% overlap, 1000 passes, 1 us dwell  | AFM            | | -     |
 |Pt        | 20050601  | Pt (Christianne)| Spot 4, 50% overlap, 248932 passes, 1 us dwell, Vol per Dose = 0.0178 um3/nC, Z-size = 500 nm | nanoSEM (43 degrees tilt) |  thickness: 495 nm (+/- 20 nm)   | -|