Differences

This shows you the differences between two versions of the page.

--- plasma_cleaner_pdf-32g-2 [2023/01/27 11:06] – [Maintenance] scholma
+++ plasma_cleaner_pdf-32g-2 [2023/02/24 07:56] (current) – [MANUAL] scholma
@@ Line 1: / Line 1: @@
-======= Plasma Cleaner manual ======
+===== Plasma Cleaner manual ====
-====== Description ======
+{{ :plasma_cleaner_pdc-32g-2_usermanual_2022.pdf |Plasma Cleaner manual}}
+==== DO's and DONT's ====
-====== Check before starting =====
+Only use bare substrate in the plasma cleaner, all exceptions should be discussed.
+  * Si
+  * SiO2
+  * glass/quartz
-====== DO's and DONT's ======
+==== MANUAL ====
+  * Load samples on the sample tray
+  * Start the vacuum pump while holding the door, make sure black valve is pointing down
+  * Pump down to <100mTorr
+  * Set black valve to the needle valve
+    * if needle valve is open the pressure should go to previous setpoint (check the logbook)
+    * or change the setpoint
+  * Wait for pressure to stabilize
+  * set RF (low, mid or high)
+  * When plasma ignites start your timer
+  * Turn off RF when timer finishes
+  * Close black valve (valve pointing down)
+  * Pump down to <100mTorr to make sure etch products are removed from the chamber
+  * Stop the vacuum pump
+  * Turn black valve to the right to vent
+    * vent slowly to avoid samples flying around in the chamber
+  * Close black valve (valve pointing down)
+  * close the door
+  * write in the logbook: name, date, sample, process conditions, any remarks
+==== Recipes ====
+Typical cleaning process:\\
+-900mTorr\\
+-3 minutes\\
+High RF
-==== Cleaning a sample ====
+=== Maintenance ===
+Tip seal change of vacuum pump\\
+Cleaning sample tray and chamber\\
-====== Maintenance =====
-[[Technicians:Technical Plasma Asher|Technicians]]