Differences

This shows you the differences between two versions of the page.

--- plasma_cleaner_pdf-32g-2 [2023/02/02 14:19] – [DO's and DONT's] scholma
+++ plasma_cleaner_pdf-32g-2 [2023/02/24 07:56] (current) – [MANUAL] scholma
@@ Line 1: / Line 1: @@
 ===== Plasma Cleaner manual ====
 {{ :plasma_cleaner_pdc-32g-2_usermanual_2022.pdf |Plasma Cleaner manual}}
 ==== DO's and DONT's ====
-Only use bare substrate in the plasma cleaner!
+Only use bare substrate in the plasma cleaner, all exceptions should be discussed.
   * Si
   * SiO2
   * glass/quartz
-all exceptions should be discussed
-==== Checking system status and before starting ====
 ==== MANUAL ====
-  * stop pump
+  * Load samples on the sample tray
-  * turn valve to the right to vent
+  * Start the vacuum pump while holding the door, make sure black valve is pointing down
-    * vent slowly to avoid samples flying around in the chamber
+  * Pump down to <100mTorr
-  * load samples
+  * Set black valve to the needle valve
-  * close vent valve (pointing down)
+    * if needle valve is open the pressure should go to previous setpoint (check the logbook)
-  * start pump, hodor
-  * pump down to <100mTorr
-  * set valve to needle valve
-    * should be going to previous setpoint (check logbook)
     * or change the setpoint
-  * wait for pressure to stabilize
+  * Wait for pressure to stabilize
   * set RF (low, mid or high)
-  * when plasma ignites start timer
+  * When plasma ignites start your timer
-  * turn off plasma when timer finishes
+  * Turn off RF when timer finishes
-  * close valve (down position)
+  * Close black valve (valve pointing down)
-  * pump down to <100mTorr
+  * Pump down to <100mTorr to make sure etch products are removed from the chamber
-  * stop pump
+  * Stop the vacuum pump
-  * vent
+  * Turn black valve to the right to vent
-  * close vent valve and pump down
+    * vent slowly to avoid samples flying around in the chamber
+  * Close black valve (valve pointing down)
+  * close the door
-==== Finishing up and leaving the system ====
+  * write in the logbook: name, date, sample, process conditions, any remarks
-==== Common problems, tips and tricks ====
 ==== Recipes ====
-typical process:\\
+Typical cleaning process:\\
 -900mTorr\\
 -3 minutes\\
 High RF
-==== Available accesoiries and tools ====
 === Maintenance ===
+Tip seal change of vacuum pump\\
+Cleaning sample tray and chamber\\