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--- resist_and_e-beam_recipes [2018/05/22 11:35] – scholma
+++ resist_and_e-beam_recipes [2018/11/19 08:32] (current) – [Electra92] scholma
@@ Line 159: / Line 159: @@
   - If your resist has become resistant to any solvent, 20 min oxygen etch in Plasmalab90 does the job nicely
-Some resists can be used as both e-beam and photoresists.
+----
 ====== Recipes summary ======
+The parameters in the following recipes are used by most users. The recipes can be used as a guideline, but should be checked for your specific process. \\
+Some resists can be used for e-beam and photolithography.
 ===== Positive Resist recipes =====
@@ Line 179: / Line 182: @@
   * spin at 4000rpm
   * bake at 150ºC for 3 min
-  * e-beam 30kV, 180ųC/cm^2
+  * e-beam 30kV, 180 µC/cm²
   * develop MIBK/IPA (1:3) 30 sec
   * stop IPA, 10 sec
@@ Line 207: / Line 210: @@
   * spin at 4000rpm
   * bake at 85ºC for 1 min
-  * e-beam 20kV at least 24ųC/cm^2
+  * e-beam 20kV at least 24 µC/cm²
   * prebake 100ºC for 2 min
   * develop AR300-47 30s
@@ Line 218: / Line 221: @@
 ==== Conductive Polymer PEDOT:PSS ====
   * spin at 4000 rpm
+  * let it dry a few minutes, typically you need three layers
+  * rinse with water before developing
   *
+==== Electra92 ====
+  * spin at 4000 rpm
+  * one layer should be enough
+  * bake at 105 °C for  5min on hot plate
+  * rinse with water before developing
 ===== Optical Resists ======