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resist_and_e-beam_recipes [2018/05/22 11:56] – [Resist stripping / liftoff] scholmaresist_and_e-beam_recipes [2018/11/19 08:32] (current) – [Electra92] scholma
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   - MaN1410 is removed extremely well with acetone   - MaN1410 is removed extremely well with acetone
   - If your resist has become resistant to any solvent, 20 min oxygen etch in Plasmalab90 does the job nicely   - If your resist has become resistant to any solvent, 20 min oxygen etch in Plasmalab90 does the job nicely
 +
 +
 +----
  
 ====== Recipes summary ====== ====== Recipes summary ======
 +The parameters in the following recipes are used by most users. The recipes can be used as a guideline, but should be checked for your specific process. \\
 +Some resists can be used for e-beam and photolithography.
  
 ===== Positive Resist recipes ===== ===== Positive Resist recipes =====
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   * spin at 4000rpm   * spin at 4000rpm
   * bake at 150ºC for 3 min   * bake at 150ºC for 3 min
-  * e-beam 30kV, 180ųC/cm^2+  * e-beam 30kV, 180 µC/cm²
   * develop MIBK/IPA (1:3) 30 sec   * develop MIBK/IPA (1:3) 30 sec
   * stop IPA, 10 sec   * stop IPA, 10 sec
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   * spin at 4000rpm   * spin at 4000rpm
   * bake at 85ºC for 1 min   * bake at 85ºC for 1 min
-  * e-beam 20kV at least 24ųC/cm^2+  * e-beam 20kV at least 24 µC/cm²
   * prebake 100ºC for 2 min   * prebake 100ºC for 2 min
   * develop AR300-47 30s   * develop AR300-47 30s
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 ==== Conductive Polymer PEDOT:PSS ==== ==== Conductive Polymer PEDOT:PSS ====
   * spin at 4000 rpm   * spin at 4000 rpm
 +  * let it dry a few minutes, typically you need three layers
 +  * rinse with water before developing
   *    * 
 +==== Electra92 ==== 
 +  * spin at 4000 rpm 
 +  * one layer should be enough 
 +  * bake at 105 °C for  5min on hot plate 
 +  * rinse with water before developing
  
 ===== Optical Resists ====== ===== Optical Resists ======
resist_and_e-beam_recipes.1526990165.txt.gz · Last modified: 2018/05/22 11:56 by scholma

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