resist_and_e-beam_recipes
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| Both sides previous revisionPrevious revisionNext revision | Previous revision | ||
| resist_and_e-beam_recipes [2018/06/19 08:18] – scholma | resist_and_e-beam_recipes [2018/11/19 08:32] (current) – [Electra92] scholma | ||
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| ====== Recipes summary ====== | ====== Recipes summary ====== | ||
| + | The parameters in the following recipes are used by most users. The recipes can be used as a guideline, but should be checked for your specific process. \\ | ||
| Some resists can be used for e-beam and photolithography. | Some resists can be used for e-beam and photolithography. | ||
| Line 181: | Line 182: | ||
| * spin at 4000rpm | * spin at 4000rpm | ||
| * bake at 150ºC for 3 min | * bake at 150ºC for 3 min | ||
| - | * e-beam 30kV, 180ųC/cm^2 | + | * e-beam 30kV, 180 µC/cm² |
| * develop MIBK/IPA (1:3) 30 sec | * develop MIBK/IPA (1:3) 30 sec | ||
| * stop IPA, 10 sec | * stop IPA, 10 sec | ||
| Line 209: | Line 210: | ||
| * spin at 4000rpm | * spin at 4000rpm | ||
| * bake at 85ºC for 1 min | * bake at 85ºC for 1 min | ||
| - | * e-beam 20kV at least 24ųC/cm^2 | + | * e-beam 20kV at least 24 µC/cm² |
| * prebake 100ºC for 2 min | * prebake 100ºC for 2 min | ||
| * develop AR300-47 30s | * develop AR300-47 30s | ||
| Line 226: | Line 227: | ||
| * spin at 4000 rpm | * spin at 4000 rpm | ||
| * one layer should be enough | * one layer should be enough | ||
| + | * bake at 105 °C for 5min on hot plate | ||
| * rinse with water before developing | * rinse with water before developing | ||
resist_and_e-beam_recipes.1529396320.txt.gz · Last modified: 2018/06/19 08:18 by scholma