resist_and_e-beam_recipes
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| resist_and_e-beam_recipes [2018/09/03 09:22] – [AR-N 7700.08] scholma | resist_and_e-beam_recipes [2018/11/19 08:32] (current) – [Electra92] scholma | ||
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| ====== Recipes summary ====== | ====== Recipes summary ====== | ||
| + | The parameters in the following recipes are used by most users. The recipes can be used as a guideline, but should be checked for your specific process. \\ | ||
| Some resists can be used for e-beam and photolithography. | Some resists can be used for e-beam and photolithography. | ||
| Line 226: | Line 227: | ||
| * spin at 4000 rpm | * spin at 4000 rpm | ||
| * one layer should be enough | * one layer should be enough | ||
| + | * bake at 105 °C for 5min on hot plate | ||
| * rinse with water before developing | * rinse with water before developing | ||
resist_and_e-beam_recipes.1535966557.txt.gz · Last modified: 2018/09/03 09:22 by scholma