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Trace: • safety_and_lab_regulations • e-beam_evaporator • atc-1800 • fei_nanosem_200

sdb:p83

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Deposition date: 20060406

Target: Pr0.5Ca0.5MO3 compound target \\
Substrate: STO-Nb \\
Pressure: 3 mbar O2 \\
Flow: 40 ml/min \\
Current: 200 mA \\
Voltage: 418 V \\
Time: 150 min \\
Temp: 840 C \\
Remarks: -\\
----
XRR: \\
Result: 160 nm\\
----
RBS: \\
Run: 20060512 \\
File: pr83 \\
Result: Channeling! peak supression in substrate much stronger than in film = > not (fully) epitaxial. Measurement repeated with tilt and rotation. Fit values see pr83_tilt3_rot3. \\
Postscript: {{sdb:pr83.ps}}
----
RBS: \\
Run: 20060512 \\
File: pr83_tilt3_rot3 \\
Result: 60 nm Pr .07 Ca .07 Mn 0.1 O .75 (sens. for O is low, O conc. is entangled with density) \\
Postscript: {{sdb:pr83_tilt3_rot3.ps}}

sdb/p83.txt · Last modified: 2006/05/15 16:07 by hessel

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