med010
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Table of Contents
Description
- very easy & fast to use, for, e.g., SEM sample metallization
- background pressure: <1E-6mbar, 650V, <150mA, 54mm targets
- no substrate cooling
Manual
Sputtering
change target
recent rates & other info
| Material | Date | Sample ID | Process parameters | Measurement | Result | Xtal | Rate |
|---|---|---|---|---|---|---|---|
| XXXX | 20060913 | 13_9_6_5 | 4.0e-3 mbar, 200 mA, 5 min, tilted | X-ray | 110 nm | 46.8 nm | 22 nm/min |
med010.1308831017.txt.gz · Last modified: 2011/06/23 12:10 by wolfgang