med010
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Table of Contents
Description
- very easy & fast to use, for, e.g., SEM sample metallization
- background pressure: <1E-6mbar, 650V, <150mA, 54mm targets
- no substrate cooling
Manual
Sputtering
- open N2 valve at wall 1/2 turn
- insert sample, close chamber, open target knob on top of chamber
- switch on (green switch), this starts prepump
- open Ar bottle and little valve
- purge 2-3x with argon (e.g., at 1E-1mbar open&close needle valve)
- if sputtering longer than 1min, switch chiller on (~18deg)
- switch turbo on at 1E-1mbar: activate “pumping unit” and “stand by”
- adjust pressure using needle valve to 5E-2mbar
- switch big dial knob to 0, set to “HTS”
- select sputtering time and press start
- adjust big dial for desired current (lower-righ indicator!)
- wait
- switch turbo pump off
- if turbo stands still, switch off machine (green button), automatic N2 purging starts
- close Ar, N2 supply ; switch off chiller
change target
- open sputter head, fix head,
- remove the two rings (with gloves, no force!)
- replace target (manual: 54mm diameter)
- note target material on machine!
recent rates & other info
| Material | Date | purpose | Process parameters | Measurement | Result | Rate |
|---|---|---|---|---|---|---|
| Ag (?) | 20110623 | SEM of SU-8 | 5E-2 mbar, 15 mA, 15s | SEM pic | nice |
med010.1308838934.txt.gz · Last modified: 2011/06/23 14:22 by wolfgang