e-beam_evaporator
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| e-beam_evaporator [2025/05/21 13:31] – [Semi-Manual Evaporation] wigbout | e-beam_evaporator [2025/06/13 13:54] (current) – [Aftermath] wigbout | ||
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| * Pump the loadlock down. | * Pump the loadlock down. | ||
| * Leave after you see that the pressure is <1e-5. | * Leave after you see that the pressure is <1e-5. | ||
| + | * In the mean time, you can stop the log. As soon as you stop it, you will see in which directory it is saved. You have to open the utilities page again, and click the stripes (third button). | ||
| + | * Click File > Open, and select your logfile. | ||
| + | * Click All, click Trace. | ||
| + | * Now a graph with all the traced log data appears, which you can copy using the copy-icon. | ||
| + | * Create a new text-file and press CTRL+V to paste. (It can take a while to paste a big logfile.) | ||
| + | * Good luck with plotting this. It's a tab-separated file. (FIXME if there is a Python code available) | ||
| ^ Material | ^ Material | ||
| - | | Ti | + | | Ti |
| - | | Cu | + | | Cu |
| - | | Au | + | | Au |
| - | | Co | + | | Co |
| - | | Nb | + | | Nb |
| - | | Pt | + | | Pt |
| - | | Al | + | | Al |
| Line 165: | Line 171: | ||
| ---- | ---- | ||
| - | ==== Manual mode ==== | ||
| - | |||
| - | The manual mode actually is a kind-of-manual mode, in which you operate the computer - you don't have to manually open and close the valves, the computer will control these subprocesses. | ||
| - | |||
| - | The following instructions can be followed after you have loaded your sample. | ||
| - | - First, we transfer the sample from the loadlock to the evaporation chamber. Click the '' | ||
| - | - Once the sampleholder is in the chamber and the valve to the loadlock is closed, change the tilt, rotation and/or angular velocity of the sample stage if necessary. | ||
| - | - Select the e-beam gun process. | ||
| - | - Now we turn to the Xtal Monitor. Select the correct crucible (i.e. the required material). | ||
| - | - Enter your desired thin film thickness. | ||
| - | - Enter a target deposition rate, a common value is 0.10 nm/s. | ||
| - | - Turn on the 10 kV high voltage. | ||
| - | - Check your material' | ||
| - | - After waiting for a 1 minute, the high voltage switches on, and you can click on the arrows of the horizontal scrolling bar to //slowly// increase the emission current of the electron beam until you have reached the desired setpoint.((It is important to increase the emission current slowly, because we want to prevent liners from cracking due to thermal stress induced by local hotspots from the electron beam.)) | ||
| - | - Close the lower viewport to prevent getting welding eyes (especially when evaporating materials with high melting points, such as Nb). | ||
| - | - When the deposition rate is roughly two-thirds towards the desired deposition rate, turn the Rate Control on.((For expensive materials (Au, Pt), you want to prevent an overshoot in the deposition rate that wastes a lot of material.)) | ||
| - | - Once your required deposition rate is reached, click the Start button to initiate deposition. | ||
| - | - Write the process pressure, deposition rate and thickness in the log book. | ||
| - | - Once the thickness is acquired, the shutter will be closed, emission current will drop, and the HV will turn off automatically. | ||
| - | - Wait for 2 minutes, so that the evaporated source can cool down. | ||
| - | - You can either | ||
| - | * Deposit another layer (go back to step 2). | ||
| - | * Transfer your sample to the loadlock, and unload (continue steps). | ||
| - | - In the Process Diagram, click the '' | ||
| - | - After your sample is back in the loadlock, you can vent the loadlock. | ||
| - | - Take the sampleholder out, using gloves. | ||
| - | - Remove your samples, and place the sampleholder in the loadlock. | ||
| - | - Pump the loadlock down. | ||
| - | |||
| - | |||
| - | ^ Material | ||
| - | | Ti | ||
| - | | Cu | ||
| - | | Au | ||
| - | | Ni | ||
| - | | Co | ||
| - | | Nb | ||
| - | | Pt | ||
| - | | Cr | ||
| - | | Py | ||
| - | | Al | ||
| - | | Ag | ||
| - | | Ge | ||
| - | |||
| - | ---- | ||
| ==== Ion Beam Gun ==== | ==== Ion Beam Gun ==== | ||
| Line 238: | Line 199: | ||
| ===== Maintaining High Quality Materials ===== | ===== Maintaining High Quality Materials ===== | ||
| - | Because the system is used by a lot of users, we strongly urge every user to be aware of others' | + | Because the system is used by a lot of users, we strongly urge every user to be aware of others' |
| + | |||
| + | When materials are refilled, they need to be molten. Why do you want to melt materials loaded into the e-beam evaporator? The metals are loaded in the form of tiny pellets. | ||
| + | These are often: | ||
| + | * Oxidized | ||
| + | * Dirty | ||
| + | * Thermally not well connected to each other or the liner | ||
| + | |||
| + | In the case of Nb, poor quality can be disastrous to the Tc and its applications in sample/ | ||
| + | Increasing the heat conductance of the pellets by melting them into a single large blob makes evaporation easier and more consistent. | ||
| + | |||
| + | |||
| + | ==== Melting ==== | ||
| + | |||
| + | Different materials have different melting points, so it is important to start with a low emission current and increase it gradually depending on the targeted metal. Melting must be done homogeneously over the entire area of the liner filled with pellets, which avoids the trapping of impurities and ensures that all pellets can be combined into a single amalgamation. So the steps are: | ||
| + | |||
| + | - Write in the logbook. | ||
| + | - Start at 1 mA and allow the material time to heat up. The goal is to achieve a glow such that you can see where the beam aims at. (At very low currents, it is safe to remove the mask on the window for better sight). Once this is achieved at 1mA (or higher for some materials, e.g.: Nb), constantly monitor the chamber pressure. You should see a sharp increase when the material is first exposed to the beam (this is mostly oxides and dirt), which is expected. | ||
| + | - Now that the glow allows for orientation, | ||
| + | - Scan over all the pallets until the pressure is once again stabilized. | ||
| + | - Go back to step 3 and repeat until you have started evaporating some material (check the material' | ||
| + | - The mA step size should start slowly and increase in the latter stages of the process. Use the logbook to gauge what a reasonable step should be, as melting is done with lower currents than evaporation. | ||
| + | |||
| + | Tips and tricks: | ||
| + | * The movement of the controller does not perfectly align with the actual movement of the beam. This results in the lower regions being unreachable via e-beam. To address this, we spend more time at the lowest point we can reach, aiming to utilize thermal conductance to melt the unreachable regions as well. | ||
| + | * Patience is key! Do not melt in a hurry, but relax with some nice music or company. | ||
| + | * In the beginning, some pallets are badly thermally connected, which sometimes causes them to be much brighter than the nearby regions. Take good care of safety for your eyes! | ||
| + | * Melting is done at ~e-8 mbar. During melting, it sometimes goes to e-6, but the start should have a good enough pressure to avoid more impurities. | ||
| + | * Throughout the melting process, the chamber pressure should never reach the ~e-5 regime. If it does, you’re either using too high of a current or melting too fast. | ||
| + | |||
| + | ==== Aftermath ==== | ||
| + | |||
| + | After melting, there are two important things to do: | ||
| + | - The conditioning of the chamber. | ||
| + | - The conditioning of the Nb. | ||
| + | |||
| + | === Conditioning the chamber: === | ||
| + | Evaporate a getter-material, | ||
| - | ==== Chamber Conditioning ==== | + | In order to get to better pressures, one could evaporate a getter-material (e.g. Ti, Nb). This type of material will absorb vaporous hydrogen, oxygen molecules and other dirty molecules in the chamber, thus reducing the pressure further. |
| + | By evaporating 5 - 10 nm of getter-material, | ||
| - | After the materials are refilled or replaced, or the quartz crystal has been replaced, the chamber needs to be pumped down. Typically, this type of maintenance | + | === Conditioning Nb: === |
| + | There is still a lot of dirt in Nb after melting. This can be seen if there is a good base pressure but a very bad Nb evaporation pressure. To solve this, we evaporate a lot of Nb the get rid of the impurities. This has the double effect of also conditioning | ||
| - | In order to get to better pressures, one could evaporate a getter-material (e.g. Ti, Nb). This type of material will ' | ||
| - | By simply evaporating 5 - 10 nm of getter-material, | ||
| - | If the pressure does not decrease any further, the best pressure is obtained. If this pressure is still too high, there might be a (virtual) leak. | ||
e-beam_evaporator.1747834292.txt.gz · Last modified: 2025/05/21 13:31 by wigbout