ion_beam_etcher
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| ion_beam_etcher [2018/07/17 10:04] – [Pumping down] scholma | ion_beam_etcher [2025/05/19 14:18] (current) – [When done] wigbout | ||
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| processing typically low energies are used to avoid damage to the imaging resist. | processing typically low energies are used to avoid damage to the imaging resist. | ||
| - | The system is equipped with a loadlock with a (sputtering gun, removed jan 2012) knudsen cell so that a deposition step | + | The system is equipped with a loadlock with a knudsen cell so that a deposition step |
| can be performed immediately after etching (a so called self aligned process). | can be performed immediately after etching (a so called self aligned process). | ||
| The substrate table can be tilted and can rotate in the tilt plane. | The substrate table can be tilted and can rotate in the tilt plane. | ||
| ====== Manual Ion beam etcher ====== | ====== Manual Ion beam etcher ====== | ||
| + | Change the input source on the display to DisplayPort if it isn't on the correct input source.\\ | ||
| + | Switch over USB cables of mouse and keyboard. | ||
| ===== Mounting sample on holder ===== | ===== Mounting sample on holder ===== | ||
| Line 42: | Line 44: | ||
| * Set MFC setpoint to 0 with the software. | * Set MFC setpoint to 0 with the software. | ||
| * Set valve override to OFF. You're now able to write a setpoint to the MFC. | * Set valve override to OFF. You're now able to write a setpoint to the MFC. | ||
| - | * Slowly increase setpoint in steps of 5% to pump away left over Ar in the line. Open MFC fully (valve override OPEN) when pressure doesn' | + | * Slowly increase setpoint in steps of 5% to pump away left over Ar in the line. Open MFC fully (100%) when pressure doesn' |
| - | * Put valve override to ' | + | * Put the setpoint to 0 and put valve override to ' |
| * Wait (~30 mins) until pressure is <1.0e-5. | * Wait (~30 mins) until pressure is <1.0e-5. | ||
| Line 55: | Line 57: | ||
| * Cool with N< | * Cool with N< | ||
| - | * {{images: | ||
| * Check if N< | * Check if N< | ||
| * Attach Hose | * Attach Hose | ||
| Line 68: | Line 69: | ||
| * Open green valve | * Open green valve | ||
| * Set Argon pressure to 2,5e-4 to 4.0e-4 mBar with program on the computer | * Set Argon pressure to 2,5e-4 to 4.0e-4 mBar with program on the computer | ||
| - | * If you can't find the computerprogram to do this, switch the screen to the IBE computer. | ||
| - | * If you are on the right computer but the software seems to be closed, you can find the program by clicking on the terminal icon on top of the desktop. Type 'cd MFC/ | ||
| * Turn on main power for ion beam (watch safety fuse) | * Turn on main power for ion beam (watch safety fuse) | ||
| * Select recipe (#10) | * Select recipe (#10) | ||
| Line 76: | Line 75: | ||
| * press ' | * press ' | ||
| * press 'view recipe' | * press 'view recipe' | ||
| - | * Make sure the ion canon shutter | + | |
| * Press " | * Press " | ||
| * To start etching press " | * To start etching press " | ||
| * Elapsed time is shown on display. You must stop the system manually once the desired etching time is reached. | * Elapsed time is shown on display. You must stop the system manually once the desired etching time is reached. | ||
| + | * Open shutter, start the timer | ||
| * Press " | * Press " | ||
| * Turn off main power for ion beam. | * Turn off main power for ion beam. | ||
| Line 91: | Line 91: | ||
| ===== When done ===== | ===== When done ===== | ||
| - | * Let ion gun cool by increasing Ar flow (1e-2 mbar, 2 min) | + | * Let ion gun cool by increasing Ar flow such that the pressure is at 1e-2 mbar (typically MFC: 20%) for about 2 min. |
| * If you cooled your sample, let the sample warm up for at least 15 min (08-04-21: Or do 5 min and do another 10 mins at 1 bar) while pumping (this to avoid possible pollution of oil or other things on your priceless sample). | * If you cooled your sample, let the sample warm up for at least 15 min (08-04-21: Or do 5 min and do another 10 mins at 1 bar) while pumping (this to avoid possible pollution of oil or other things on your priceless sample). | ||
| * Close green Argon valve. | * Close green Argon valve. | ||
| - | * Let the Argon be pumped out the conduct | + | * Let the Argon be pumped out the conduct, increase |
| + | * Wait a few minutes and close MFC. | ||
| * Set black Argon valve to neutral | * Set black Argon valve to neutral | ||
| * Turn off turbo pump | * Turn off turbo pump | ||
| - | * Turn off rotary pump | + | * Close valve to the rotary pump |
| - | * Wait until turbo pump has decelerated | + | |
| * Vent the system slowly with the " | * Vent the system slowly with the " | ||
| - | * If you cooled with N< | + | |
| + | | ||
| * Remove sample holder | * Remove sample holder | ||
| * Pump chamber down for a few minutes with rotation pump (no turbo). | * Pump chamber down for a few minutes with rotation pump (no turbo). | ||
| - | * Remove sample, clean sample holder with acetone and IPA. | + | |
| - | * Shut down rotation pump if you are the last person on the day. | + | |
| - | * Fill in the log sheets. COPIES OF THE LOG SHEET ARE HERE: {{wiki: | + | * Fill in the logbook |
ion_beam_etcher.1531821882.txt.gz · Last modified: 2018/07/17 10:04 by scholma