The NanoLab hosts shared facilities that are part of Leiden Institute of Physics. The NanoLab equipment for thin film deposition, lithography, etching, inspection and other processing equipment can be found on the Facilities page. If you want to use the equipment, you can find contact information on the webpage of the equipment.

The NanoWiki is a system of webpages that can be read, improved and extended by everyone who has access to them and functions as the group's common knowledge base. Access is limited to selected local users only.

• Spin coater POLOS SPIN150i
• Resist recipes
• EBPG Raith-100
• Optical lithography KarlSuss MA45 Mask aligner

• Plasma Cleaner PDF-32G-2
• Plasmalab Reactive Ion Etcher
• Ion beam etcher

• Tube Oven - H2, Ar and Vacuum Annealing
• Tube Oven - O2 and Ar Annealing

• Resistance evaporator
• E-beam evaporator ( updated instructions)
• K-cell evaporator

• ATC 1800F magnetron sputtering system
• UHV magnetron sputtering system
• Z-406 diode sputtering system
• Z-407 automatic diode sputtering system
• Oxide epitaxy sputtering system
• Cressington 208hr sputter coater

• ApreoSEM Thermofisher
• Nikon LV150 optical microscope
• Bruker DektakXT profilometer

• Wire bonder ( updated instructions)
• Dishwasher cleanroom

• Deposition processes and rates
• Resist and e-beam recipes
• Optical lithography recipes
• Ion etching recipes and rates
• Wet etching recipes and rates

• Safety and lab regulations
• Working with chemicals

(this section is completely out of date)

• MSM Papers
• Recent papers
• Group meeting talks
• Student reports
• Relevant literature
• Books
• Conference talks

• Latex links and examples
• Software and Computers
• Cables and connectors

Contact Marcel Hesselberth if you have questions about this documentation system or want to add new pages. Edit a page only if you are sure you will improve it (read how).